PN-S-900M SEM Sample Preparation
The PN-S-900M Magnetron Sputtering Bench-Top sputtering machine is ideal and designed for lab SEM sample preparation.
It is widely used to coat non-conductive or heat-sensitive SEM samples with non-oxidizing materials for better imaging.
Designed for lab SEM sample preparation
Operates within a vacuum range of 200Pa to 8Pa, ensuring optimal conditions for efficient coating deposition.
It is employed to deposit non-oxidizing materials onto SEM samples that are non-conductive or heat-sensitive, enhancing imaging quality.
Operating with manual control.
Technical Details for Magnetron Sputtering Bench Top Sample Preparation for SEM-900M
Chamber size | Add φ150 * 120mm (height) Scratch Resistant Quartz Glass New |
Target size | 50 mm dia |
Weight | 45 kg |
Size | 340mm x 390mm × 300mm |
Wind Speed Range | 0.2-0.6 (m/s) |
Operation Method | Instruction Manual |
Vacuum Pump | Rotary Pump (oil needed) |
Rotary pump speed | Add New50 Hz : 8 m /h (2.2 L/s) / 60 Hz : 9.6m /h (2.6 L/s) |
Vacuum Limit | 2 Pa |
Working pressure | 150mTorr – 60 mTorr |
Vacuum Measure | Measuring range from atmosphere to 2x10 mbar |
Vacuum time | <5 min ( 2 Pa ) |
Max Evaporation Current | 100A |
Power Consumption | <2000W |
Power supply: | AC 110V 60Hz or AC 220V 50Hz |
Gas control | Gas flow controller |
Warranty | One year limited warranty with lifetime product support |